Background Information: 

Dr. Cui Bo is currently a tenured full professor at Ningbo Eastern Institute of Technology. He graduated from the Department of Physics of Peking University with a bachelor's degree in 1994. He received his master's degree and doctorate degree from the Department of Electrical Engineering of Princeton University in the United States in 2000 and 2003, respectively. From 2003 to 2008, he conducted research at the National Research Council of Canada. In 2008, he joined the Department of Electrical and Computer Engineering at the University of Waterloo, Canada, and was promoted to tenured full professor in 2019. After resigning from the University of Waterloo in December 2023, he joined Ningbo Eastern Institute of Technology. So far, he has published 135 journal articles and edited a monograph on nanofabrication.

Research Field:

His research focus are mainly micro-nano structure and device fabrication, including optical lithography, electron beam lithography, nanoimprinting, focused ion beam, and PVD/CVD/ALD thin film deposition, and dry/deep silicon/wet etching; with applications in MEMS manufacturing, nanoimprint template manufacturing, nano-optical devices (AR/VR optical waveguide gratings, meta-structure/meta-surface lenses, passive silicon optical structures, etc.), silicon-based hollow biological microneedles for injection, AFM Probes, biosensors, microLEDs, terahertz receiving/emitting devices, through silicon vias for inserting optical fibers, microlenses and other fields.

Educational Background:

2000-2003: PhD, Department of Electrical Engineering, Princeton University

1998-2000: Master, Department of Electrical Engineering, Princeton University

1996-1998: Master's study (without degree), Department of Electrical and Computer Engineering, University of Minnesota

1989-1994: Bachelor, Department of Physics, Peking University

Work Experience:

2024-present: College of Information Science & Technology, Ningbo Eastern Institute of Technology, Professor

2008-2023: Department of Electrical and Computer Engineering, University of Waterloo, Assistant-Associate-Full Professor

2003-2008: National Laboratory of Canada (NRC), Associate Researcher

Academic Experience: 

2021-2024: School of Microelectronics, Shanghai University, Adjunct Professor (Master’s student supervisor)

2011-2011: Visiting Scholar, Trinity College Dublin

Academic Part-time Jobs (Partial):

2010-2023: Nanoscale Research Letters (Springer) 期刊编委

2008-2023：Program committee member (and session chair or co-chair) for the International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN).

2017-2022：Technical Program Committee member (and session co-chair), IEEE-NEMS conference

2009-2015：International Program Committee member for MNE (Micro and Nano Engineering) conference.

2011-2011：Technical program committee member for IEEE Canadian Conference on Electrical and Computer Engineering.

2011-2016：Facility access proposal reviewer for Molecular Foundry, Lawrence Berkeley National Laboratory.

Awards and Honors:

2018: ECE Research Award, University of Waterloo (2 out of 92 ECE faculty members awarded).

2014: Engineering Research Excellence Award, University of Waterloo (3 out of 295 engineering faculty members awarded). 

2012: Dobbin Scholarship, Ireland Canada University Foundation.

Representative Works:

General Information

More than 130 SCI papers; 4 main works other works

Works Information and Citation Data

Google Scholar:

https://scholar.google.ca/citations?hl=en&user=qxm1begAAAAJ

10 Representative Works (Cui’s student/postdoc in boldface, * refers to the corresponding author)

1.      A. Pan, C. Zhu, Z. Yan, X. Zhu, Z. Liu, and B. Cui*, “Fabrication of the Highly Ordered Silicon Nanocone Array With Sub-5 nm Tip Apex by Tapered Silicon Oxide Mask”, IEEE Transactions on Semiconductor Manufacturing, 37(2), 160 (2024).

2.      H. Wu, A. Pan, C. Zhu, and B. Cui*, “Fabrication of slanted gratings by using glancing angle deposition”, Journal of Vacuum Science & Technology B 42 (2), 023002 (2024).

3.      D. Zhang, W. Hu, and B. Cui*, “Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching”, Journal of Vacuum Science & Technology B 42 (5), 053001 (2024).

4.      C. Zhu, H. Ekinci, A. Pan, B. Cui, and X. Zhu, “Electron beam lithography on nonplanar and irregular surfaces”, Microsystems & Nanoengineering 10 (1), 52 (2024).

5.      R. Islam, B. Cui, G. X. Miao, “Dry etching strategy of spin-transfer-torque magnetic random access memory: A review”, J. Vac. Sci. & Technol. B, 38, 050801 (2020).

6.      Y. Li, H. Zhang, R. Yang, Y. Laffitte, U. Schmill, W. Hu, M. Kaddoura, E. J. M. Blondeel, and B. Cui*, “Fabrication of sharp silicon hollow microneedles by deep reactive ion etching towards minimally-invasive diagnostics”, Microsystems & Nanoengineering, 5, 41 (2019).

7.      X. Zhang, Y. Liu, M. Soltani, P. Li, B. Zhao, and B. Cui*, “Probing the interfacial charge transfer process of uniform ALD semiconductor-molecule-metal models: an SERS Study”, Journal of Physical Chemistry C, 121 (48), 26939–26948 (2017).

8.      R.K. Dey, F. Aydinoglu, and B. Cui*, “Electron beam lithography on irregular surface using grafted PMMA monolayer as resist”, Advanced Materials - Interfaces, 4, 1600780 (2017).

9.      J. Zhang, C. Con and B. Cui*, “Electron beam lithography on irregular surfaces with evaporated resist”, ACS Nano, 8, 3483–3489 (2014).

10.    C. Con, J. Zhang and B. Cui*, “Nanofabrication of high aspect ratio structures using evaporated resist containing metal”, Nanotechnology, 25, 175301 (2014).